Comparison ledger
Headway 1 EC 101 R 485 Photoresist Spinner, Laurell EDC-650-8 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | EDC-650-8 BLaurell | |
|---|---|---|
| OEM | Headway | Laurell |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | 200mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Headway 1 EC 101 R 485 Photoresist Spinner | Laurell EDC-650-8 B |
| Specifications | ||
| Vacuum requirement | 23" Hg[1] | — |
| Electrical | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| OEM | — | Laurell[2] |
| Model | — | EDC-650-8 B[2] |
| Model type | — | EDC System[2] |
| Controller | — | 650-series[2] |
| Max. substrate size | — | ø 200mm (7" × 7")[2] |
| Max. RPM | — | 12000 rpm[2] |
| Mounting options | — | Tabletop, In-Deck, On-deck[2] |
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