Comparison ledger
EV Group 620 Mask, Quintel Q 7000 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 620 MaskEV Group | Q 7000 MaskQuintel |
|---|---|---|
| OEM | EV Group | Quintel |
| Category | Lithography | Lithography |
| Wafer size | 3 Station Wafer Handler | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 620 | Quintel Q 7000 Mask |
| Specifications | ||
| Voltage | 200 V[2] | — |
| Phase | 2 Phase[2] | — |
| Configuration | 50 / 60 Hz[2] | complete with Optek QTL2001 optics and IR illumination package[1] |
| Current Rating | 10 A[2] | — |
| Interrupting Capability | 50 kiloamps[2] | — |
| Overcurrent Protection | Provided at machine terminals[2] | — |
| Frequency | 50/60 Hz[3] | — |
| Power consumption | 1.55 kW[3] | — |
| Full load current rating | 7.45 A[3] | — |
| Largest current rating | 7.45 A[3] | — |
| Breaker size / AIC | 10 A / 10 kA[3] | — |
| Compressed Air (CDA) | 6 bar / 87 psi[3] | — |
| Nitrogen or CDA | 6 bar / 87 psi[3] | — |
| Vacuum | < 850 mbar / 6460 torr[3] | — |
| Wafer Sizes | 2, 3, 4, 5, 6, 12 inch[3] | — |
| Backside Alignment | Capable[4] | — |
| Infrared Alignment | Capable[4] | — |
| Chuck Size | 5 inch to 6 inch[4] | — |
| OEM | EV Group[2] | — |
| Model | 620 Mask[2] | — |
| Equipment type | Mask Aligner[2] | — |
| Category | Lithography[2] | — |
| Wafer size | 4 inch[2] | — |
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