Waferpedia

Comparison ledger

EPX 180 NEversus160 XP

Edwards EPX 180 NE, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
EPX 180 NEEdwards
160 XPVarian
OEMEdwardsVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones2008 Vintage year—
Control system——
Generation——
FamilyEdwards EPX 180 NEVarian 160 XP
Cited variants—
Specifications
Pumping speed106 CFM[2]—
Ultimate vacuum< 7 x 10^-5 Torr[2]—
InletISO63[2]—
ExhaustKF25[2]—
Weight104 lbs[2]—
Voltage200/208V[3]—
Frequency50/60 Hz[3]—
Current16 Amps[3]—
Display and control panelIntegrated[3]—
Gas purgeHigh temperature gas purge assembly[3]—
MountingMetric eyebolt / heavy duty mount base[3]—
Configuration (160 XP Ion variant)—150mm High Current IMP[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]provac.comprovac.com
  3. [3]fab-spares.comfab-spares.com