Comparison ledger
Canon FPA 6000 ES 6 a, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 6000 ES 6 aCanon | 1505 G 6 ENikon |
|---|---|---|
| OEM | Canon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1988– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 6000 | Nikon 1505 |
| Specifications | ||
| Configuration | 248nm (KrF)[1] | 5" reticle[5] |
| Manufacturer | Canon[2] | — |
| Model | FPA 6000 ES 6 a[1] | 1505 G 6 E[5] |
| Wafer size | 12 inch[1] | — |
| Exposure wavelength | 248nm (KrF)[2] | — |
| Process | DUV (248nm) KRF[3] | — |
| Category | Lithography[2] | Stepper[5] |
| Tool type | lithography scanner[2] | — |
| Numerical aperture (NA) | 0.55 ~ 0.86[4] | — |
| Resolution | 0.09µm[4] | 650 nm[6] |
| Reticle size | 6in. (0.25in. thick)[4] | — |
| Reduction ratio | 4:1[4] | — |
| Field size | 26mm x 33mm[4] | — |
| Overlay accuracy | ≤8nm (M+3)[4] | — |
| Throughput | ≥100wph (300mm, 122shots); ≥170wph (200mm, 58shots)[4] | — |
| Scanner vintage | 2005[3] | — |
| Numerical Aperture | — | 0.54[6] |
| Reduction | — | 5x[6] |
| Exposure Field | — | 15 x 15 mm[6] |
| Alignment Accuracy | — | 130 nm[6] |
| Wafer Size | — | 4 inch[5] |
| Light Source | — | g-line[7] |
| Introduction Year | — | 1988[6] |
| NA (Numerical Aperture) | — | 0.54[6] |
| Make | — | Nikon[5] |
| Wafer Sizes | — | 4 inch[5] |
| Exposure type | — | g-line[6] |
| NA | — | 0.54[6] |
| Exposure field | — | 9.3 x 18.8 mm[6] |
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