Comparison ledger
Canon FPA 5510 iZ i-Line, Nikon SF 130, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 5510 iZ i-LineCanon | SF 130Nikon |
|---|---|---|
| OEM | Canon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 5510 | Nikon SF 130 |
| Specifications | ||
| Configuration | Wide-Field[1] | With:[3] |
| Wafer Size | 12 inch (300 mm)[1] | — |
| Type | i-Line Stepper[1] | — |
| Field | Wide-Field[1] | — |
| Wafer size | 12 inch[2] | — |
| Operating System | — | Windows[3] |
| Manufacturer | — | Nikon[3] |
| Model | — | SF 130[3] |
| Category | — | Lithography[4] |
| Light Source | — | i-line mercury lamp (365 nm wavelength)[5] |
| Exposure Wavelength | — | 365 nm[6] |
| Max Wafer Size | — | 200 mm[6] |
| Numerical Aperture | — | ~0.50[6] |
| Throughput | — | about 100 wafers per hour[6] |
| Common Process Node | — | ≥ 0.25 μm[6] |
| Tool type | — | lithography stepper[4] |
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