Comparison ledger
Canon FPA 5500 iZa i-Line, Nikon NSR SF 155 i-Line, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 5500 iZa i-LineCanon | NSR SF 155 i-LineNikon |
|---|---|---|
| OEM | Canon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 5500 | Nikon NSR |
| Specifications | ||
| Configuration | Wide-Field[1] | SMIF / FOUP[3] |
| Machine type | Stepper[1] | — |
| Exposure source | i-line[2] | — |
| Wafer size | 8 inch[1] | — |
| Field configuration | Wide-field[2] | — |
| Manufacturer | Canon[1] | — |
| Load Module | — | SEMES EFEM[3] |
| Nikon Lens | — | SRI 12 M 4 IL 2 SS[3] |
| Reticle Size | — | 6 inch[3] |
| Wafer Type | — | Notch[3] |
| Inline Flow | — | In-Line[3] |
| Alignment System | — | FIA Modification for Colored Resist[3] |
| WL Type | — | 12 inch[3] |
| Mercury Lamp | — | 7.5 KW (SUV 7500 NI)[3] |
| LLTC TeompSetting | — | 23 Deg C[3] |
| Exposure Wavelength | — | i-line (365 nm)[4] |
| Light Source | — | Mercury lamp[4] |
| Reduction Ratio | — | 5×[4] |
| Resolution | — | ≥0.5 µm[4] |
| Wafer Sizes (standard) | — | 150 mm (6 inch) and 200 mm (8 inch)[4] |
| Stage System | — | Precision XY wafer stage with closed-loop positioning[4] |
| Operating System | — | Windows[3] |
| PM1 | — | UV Lamp[3] |
| PM2 | — | Stage[3] |
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