Waferpedia

Comparison ledger

FPA 5000 ES 3versus150 e Mask

Canon FPA 5000 ES 3, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
OEMCanonSUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon FPASUSS MicroTec 150 e Mask
Specifications
ConfigurationWith:[1]—
ManufacturerCanon[1]—
ModelFPA 5000 ES 3[1]—
CategoryLithography[2]—
TypeStepper[1]—
Optics & imagingCymer ELS 6300 Laser[2]—
Configuration & optionsRasco BCU 900 Brine Chilling Unit[2]—
Vintage2001[1]—

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com