Comparison ledger
Brewer Science B2, Karl Suss MA-4, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | B2Brewer Science | MA-4Karl Suss |
|---|---|---|
| OEM | Brewer Science | Karl Suss |
| Category | Lithography | Lithography |
| Wafer size | 100mm | 100mm |
| Process node | DUV | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Brewer Science B2 | Karl Suss MA-4 |
| Specifications | ||
| Type | Developable BARC[1] | — |
| Name in ACT-8 process list | B2 DUV42P[1] | — |
| Configured wafer size on ACT-8 | 100 mm (4") wafers[1] | — |
| OEM | — | Karl Suss[2] |
| Model | — | MA-4[2] |
| Equipment type | — | Mask Aligner[2] |
| Substrate size | — | Up to 4" (100mm) in diameter[2] |
| Sample compatibility | — | Works for smaller samples[2] |
| Alignment mode | — | Contact/proximity aligner[2] |
| Illumination wavelengths | — | 365 nm or 405 nm[2] |
| Backside alignment | — | Real-time infrared through-wafer backside alignment[2] |
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