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Comparison ledger

200 PCU Photoresist StabilizerversusCertas RST Process

Axcelis 200 PCU Photoresist Stabilizer, Tokyo Electron Certas RST Process, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Certas RST ProcessTokyo Electron
OEMAxcelisTokyo Electron
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200Tokyo Electron Certas RST Process
Specifications
Configuration14 Amps[1]—
Voltage380 V[1]—
Frequency50 Hz[1]—
Phase3 Phase[1]—
Wafer Size—300mm[3]
Process Type—Dry Etcher[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]fabsurplus.comfabsurplus.com