Comparison ledger
ASML XT 1900 Gi, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | XT 1900 GiASML | 1505 G 6 ENikon |
|---|---|---|
| OEM | ASML | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1988– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML XT 1900 Gi | Nikon 1505 |
| Specifications | ||
| Immersion Scanner | 193 mm[1] | — |
| Software Version | 5.1[2] | — |
| CIM | SECS[2] | — |
| Process | 40/45 nm[2] | — |
| Type | Immersion scanner[2] | — |
| Optics | 193 mm[2] | — |
| Wafer application | 300 mm wafer batch production[3] | — |
| Exposure wavelength | 193 nm[3] | — |
| Numerical aperture | 0.85~1.35[3] | — |
| Resolution | 40 nm[3] | 650 nm[5] |
| CDU | 2.5 nm[3] | — |
| Overlay precision | 6 nm[3] | — |
| Throughput | 131 wafers/hour (based on 125 exposures per wafer)[3] | — |
| Configuration | — | 5" reticle[4] |
| Numerical Aperture | — | 0.54[5] |
| Reduction | — | 5x[5] |
| Exposure Field | — | 15 x 15 mm[5] |
| Alignment Accuracy | — | 130 nm[5] |
| Wafer Size | — | 4 inch[4] |
| Light Source | — | g-line[6] |
| Introduction Year | — | 1988[5] |
| NA (Numerical Aperture) | — | 0.54[5] |
| Make | — | Nikon[4] |
| Model | — | 1505 G 6 E[4] |
| Category | — | Stepper[4] |
| Wafer Sizes | — | 4 inch[4] |
| Exposure type | — | g-line[5] |
| NA | — | 0.54[5] |
| Exposure field | — | 9.3 x 18.8 mm[5] |
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