Comparison ledger
ASML XT 1250 D, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | XT 1250 DASML | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML XT 1250 D | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | ArF[1] | — |
| Manufacturer | ASML[2] | — |
| Model | XT 1250 D[2] | — |
| Category | Lithography[1] | — |
| Wafer size | 6 inch[3] | — |
| Light source | Cymer XLA165[3] | — |
| Wafer stage | Dual chuck[3] | — |
| Wafer configuration | Dry[3] | — |
| Carrier handler type | Mark I 300 FOUP[3] | — |
| Reticle stage measurement system | Heidenhain encoders[3] | — |
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