Comparison ledger
ASML Twinscan AT 1100, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Twinscan AT 1100ASML | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML Twinscan | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 50/60 Hz[1] | — |
| Voltage | 230 V[1] | — |
| Phase | 3 Phase[1] | — |
| Light source | 193 nm ArF laser[2] | — |
| Projection optics | Carl Zeiss Star Lith 1100, numerical aperture 0.75[2] | — |
| Resolution | 100 nm[2] | — |
| Overlay accuracy | <20 nm at full throughput[2] | — |
| Throughput | 93 wafers per hour for 300 mm wafers[2] | — |
| Laser repetition rate | 4 kHz[2] | — |
| Dual wafer stage | Yes[2] | — |
| Wafer sizes | 8 inch / 200 mm, 12 inch / 300 mm[1] | — |
| Power electrical | 50/60 Hz, 230 V, 400 VAC, 3 Phase[1] | — |
| Laser model | Cymer NL 7600 A[1] | — |
| Included accessories | HDD & Software[1] | — |
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