Comparison ledger
ASML PAS 5500 750, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PAS 5500 750ASML | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML PAS 5500 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 248nm (KrF)[1] | — |
| Software Version | 8.9.0.C[2] | — |
| CIM | SECS[2] | — |
| Handler System | Wafer Transfer System[2] | — |
| Options System | Operator Console Unit[2] | — |
| Factory interface | SMIF[2] | — |
| OEM | ASML[1] | — |
| Model | PAS 5500 / 750[1] | — |
| Wafer size | 8 inch[1] | — |
| Exposure wavelength | 248nm[1] | — |
| Light source | KrF[1] | — |
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