Comparison ledger
ASML PAS 2000, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PAS 2000ASML | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | 1984 | — |
| Production run | 1985– | — |
| Lifecycle | Legacy | — |
| Lifecycle milestones | 1984 First product · 1984 First product introduced | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML PAS 2000 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Product type | Lithography machine[1] | — |
| Wafer motion mechanism | Oil pressure instead of electric motors[1] | — |
| Critical dimension | 1.0 to 1.3 micron[2] | — |
| Overlay accuracy | 0.25 micron[2] | — |
| Wafer movement mechanism | Oil pressure[1] | — |
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