Waferpedia

Comparison ledger

Centura eMax CT 3 CHversus1512e

Applied Materials Centura eMax CT 3 CH, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Centura eMax CT 3 CHApplied Materials
1512eTegal
OEMApplied MaterialsTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials Centura eMax CT 3 CHTegal 1512e
Specifications
Wafer size12 inch[1]—
Tool type—Industrial RIE plasma etcher system[2]
Stated configuration—With modules assembly for CI-4222[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]semistarcorp.comsemistarcorp.com