Waferpedia

Comparison ledger

0041-39086 ESC PartversusTSP 305 SCCM SE+ Oxide

Applied Materials 0041-39086 ESC Part, Tokyo Electron TSP 305 SCCM SE+ Oxide, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
OEMApplied MaterialsTokyo Electron
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Tokyo Electron TSP 305 SCCM SE+ Oxide
Specifications
Vintage—2006, 2007, 2008[1]
Wafer Size—12"[2]
Carrier—FOUP (Comply with SEMI E47.1, 25 wafers)[2]
Interface—5 Carrier stage (Continuous flow operation) with Semi compliant MENV and FIMS assemblies[2]
Process Chambers—4 chambers, SCCM Oxide with Y2O3 coating[2]
End Point Detector—SE2000ii[2]
ESC Type—Ceramics ESC with STD Vpp[2]
Focus Ring—3.4mm[2]
TMP—TMP-3403LMC-T4(VG300) (SHIMADZU)[2]
Dry Pump—ESR80WN, KEG approved[2]
APC—Pendulum Motion Dia., 320mm(VAT), R.T.~90deg[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]achilles-tech.comachilles-tech.com