Waferpedia

Comparison ledger

0041-39086 ESC PartversusCentura eMax Nitride

Applied Materials 0041-39086 ESC Part, Applied Materials Centura eMax Nitride, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
Centura eMax NitrideApplied Materials
OEMApplied MaterialsApplied Materials
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Applied Materials Centura
Specifications
Configuration—2 Chamber Emax[1]
Gas—CF4, CH2F2, CHF3, Ar, O2, N2[1]
OS—AMAT Legacy[1]
Buffer Robot—HP[1]
Chiller 1—AMAT Endura HX 18706-01[1]
Chiller 2—Thermo Electron HX 150 106178026[1]
Wafer size—8 inch[1]
Chamber configuration—2 Chamber Emax; 1 Orienter/degas[1]
Gas chemistry—CF4, CH2F2, CHF3, Ar, O2, N2[1]
Operating system—AMAT Legacy[1]
Chamber #A—eMAX[1]
Chamber #B—eMAX[1]
Chamber #C—EMPTY[1]
Chamber #D—EMPTY[1]
Chamber #E—EMPTY[1]
Chamber #F—Orienter[1]

Plan your fab

Building a Etch process? Get a complete equipment list.

Open the fab equipment planner →
Sources (1)Every fact above is drawn from these public sources
  1. [1]inventory listing