Waferpedia

Comparison ledger

0041-39086 ESC PartversusCentura AP eMax CT+

Applied Materials 0041-39086 ESC Part, Applied Materials Centura AP eMax CT+, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
Centura AP eMax CT+Applied Materials
OEMApplied MaterialsApplied Materials
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Applied Materials Centura AP eMax CT+
Specifications
Wafer size—300 mm[1]
Chamber configuration—3 chambers[1]
Vintage year—2007[2]
Process type—Oxide etch[1]
Manufacturer—Applied Materials[3]
Model—Centura AP eMax CT+[3]
Tool type—Etcher[3]
Application—Semiconductor manufacturing[2]
Vintage—01.06.2007[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]fabsurplus.comfabsurplus.com
  2. [2]waferpedia.comwaferpedia.com
  3. [3]Equipment inventory listing