Waferpedia

Comparison ledger

0020 23839 PartversusMPS 4-20 C Vacuum

Applied Materials 0020 23839 Part, CHA MPS 4-20 C Vacuum, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 23839 PartApplied Materials
OEMApplied MaterialsCHA
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 23839 PartCHA MPS 4-20 C Vacuum
Specifications
ConfigurationPlate, Sensor Clamp, Hdpcvd Ultima +[1]—
Water—8.25 GPM[2]
Air—90-100 PSI[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing