Waferpedia

Comparison ledger

0020 17485 PartversusImpulse

Applied Materials 0020 17485 Part, Applied Materials Impulse, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
ImpulseApplied Materials
OEMApplied MaterialsApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartApplied Materials Impulse
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]Sputtering only[2]
Process Type—Sputtering[2]
Wafer Size—12 inch[2]
Category—PVD (Physical Vapor Deposition)[2]
OEM—Applied Materials[2]
Model—Impulse[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing