Comparison ledger
Applied Materials 0010 47763, Oxford Instruments Plasmalab 100 ICP 180 RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | Plasmalab 100 ICP 180 RIEOxford Instruments |
|---|---|---|
| OEM | Applied Materials | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Oxford Instruments Plasmalab 100 |
| Specifications | ||
| Configuration | 2nd Source New[1] | With VAT PM-5 Adaptive Pressure Controller[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | Plasmalab 100 ICP 180[4] |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Voltage | — | 208V, 50/60Hz[4] |
| Manufacturer | — | Oxford Instruments[4] |
| Tool type | — | Reactive Ion Etcher[4] |
| Category | — | Etch[5] |
| Wafer size | — | 6 inch[4] |
| Power | — | 208V, 50/60Hz[4] |
| Adaptive pressure controller | — | VAT PM-5[4] |
| Turbopump controller | — | Adixen ACT 1300M[4] |
| Vacuum pump | — | Leybold D65BCS with oil filter and exhaust filter[4] |
| Gas delivery | — | Gas Box[4] |
| Control computer | — | Control Computer (no HDD)[4] |
| Monitor | — | LCD Monitor[4] |
| Chiller | — | Thermo Neslab Chiller[4] |
| Computer cart | — | Computer Cart[4] |
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