Comparison ledger
Applied Materials 0010 47763, Lam Research Rainbow 4506 I, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | Rainbow 4506 ILam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research Rainbow |
| Specifications | ||
| Configuration | 2nd Source New[1] | Oxide Etch[4] |
| Type | Monopolar Dual Heated[2] | Plasma etcher[5] |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | — |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Wafer type | — | Jeida flat[4] |
| Valve type | — | AC4 Throttle / VAT Throttle[4] |
| Software | — | Classic 7.31-42[4] |
| RF | — | PDW2200 400Kc generator (main chamber)[4] |
| Robot type | — | Harmonic Drive[4] |
| Loader type | — | Hine indexers 38A[4] |
| Loadlock | — | Entrance (ISO chmbr) and Exit LL[4] |
| Turbo pumps | — | No[4] |
| Controllers | — | VAT controller ISO THV / AC4 controller main chamber THV[4] |
| GAS 1 | — | Ar: 500 sccm[4] |
| GAS 2 | — | CF4: 100 sccm[4] |
| GAS 3 | — | CHF3: 50 sccm[4] |
| GAS 4 | — | He: 1000 sccm[4] |
| GAS 5 | — | O2: 20 sccm[4] |
| GAS 6 | — | N2: 540 sccm[4] |
| Wafer sizes | — | 6 inch, 8 inch[4] |
| Process | — | Oxide etch[4] |
| Endpoint | — | Monochromator Endpoint[4] |
| RF cart | — | Present[4] |
| ISO module | — | Present[4] |
| GAS 7 | — | NF3: 1150 sccm[4] |
| GAS 8 | — | He: 480 sccm[4] |
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