Comparison ledger
Applied Materials 0010 47763, Lam Research AutoEtch 490, Parts, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | AutoEtch 490, PartsLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | 6-inch capability |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research AutoEtch 490, Parts |
| Specifications | ||
| Configuration | 2nd Source New[1] | — |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | Lam AutoEtch 490, Parts Machine[4] |
| OEM | Applied Materials[1] | Lam Research[4] |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Condition | — | Parts Machine, Sell it at AS IS ,Where Is term.[4] |
| Quantity | — | 1 set[4] |
| Wafer Size | — | 6-inch capability[4] |
| Valid Time | — | Subject to prior sale[4] |
| Lead Time | — | Ready to go[4] |
| Category | — | Plasma Etch[4] |
| Original Equipment Manufacturer | — | Lam Research[4] |
| Warranty | — | N/A[4] |
| Refund | — | N/A[4] |
| Inspection | — | Against appointment[4] |
| Wafer size capability | — | 6-inch capability[4] |
| System type | — | in-line, cassette-to-cassette, fully automated, single-wafer, double airlocked, parallel plate plasma etching system[5] |
| Chemistries | — | chlorine and Freon chemistries[6] |
| Applications | — | Polysilicon; Silicon Nitride; Refractory metal silicides; Thin dielectrics[6] |
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