Comparison ledger
Applied Materials 0010 47763, Lam Research A 6 Exelan HPT, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | A 6 Exelan HPTLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1997 manufactured |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research A 6 Exelan HPT |
| Specifications | ||
| Configuration | 2nd Source New[1] | 3 Chambers[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | Alliance A 6 Exelan HPT Dielectric[5] |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Manufacturer | — | Lam Research[5] |
| Category | — | Etch[5] |
| Wafer size | — | 8 inch (200 mm)[5] |
| Chamber configuration | — | Exelan HPT chambers (2) and 4520 chamber[5] |
| Vacuum & pumping | — | 1 TM Pump to Dual Pump (1 for Load Lock / 1 for TM)[6] |
| Gas & chemistry | — | To use 10 Gases, the Gas Box needs to be enhanced[6] |
| Configuration & options | — | 3 Chambers[4] |
| Condition | — | Refurbished[4] |
| Last confirmed date | — | November 12, 2024[4] |
| Vintage year | — | 1997[5] |
| Gas box note | — | To use 10 gases, the Gas Box needs to be enhanced[4] |
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