Comparison ledger
Applied Materials 0010 47763, Lam Research 2300 e 5 Kiyo, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | 2300 e 5 KiyoLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research 2300 |
| Specifications | ||
| Configuration | 2nd Source New[1] | 3 Chamber + 1 Strip[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | — |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Loadport | — | TDK TAS300[4] |
| ATM Robot | — | Kawasaki P/N 3NT510B-A002[4] |
| TM Robot | — | Brooks 201600-294-0002[4] |
| MKS E28D-29237 Process Vacuum Gauge | — | 0.1 Torr[4] |
| MKS 625D-30518 Chamber Vacuum Gauge | — | 1 Torr[4] |
| Number of Chambers | — | 3 Chamber + 1 Strip[4] |
| Turbo Pump | — | Edwards STP-XA3203CV[4] |
| Turbo Pump Controller | — | Edwards SCU-1600[4] |
| Bias RF Generator | — | Lam 3156110-214[4] |
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