Waferpedia

Comparison ledger

0010-22161 High EFF RF Matchversus2300C/D

Applied Materials 0010-22161 High EFF RF Match, Varian 2300C/D, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
2300C/DVarian
OEMApplied MaterialsVarian
Category——
Wafer size——
Process node——
Introduced——
Production run—1987–2007
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchVarian 2300C/D
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]—
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Power source—Klystron[3]
Photon energy configuration—6 & 10/15/18/25 MV[3]
Maximum dose rate (photons)—600 MU/min[3]
Electron energies—Yes[3]
Maximum dose rate (electrons)—1000 MU/min[3]
Multi-leaf collimator (MLC)—80 leaves (field size 40x40 cm); 120 leaves available (field size 40x40 cm, central 20 cm 5 mm leaf width, outer 20 cm 10 mm leaf width)[3]
Portal imager (EPID)—LC250, aS500, aS1000 (optional)[3]
kV imaging for IGRT—OBI (optional)[3]
Cone-beam CT—Only with OBI[3]
Treatment delivery—3D, IMRT, SRS/SBRT (optional)[3]
Stereotactic radiosurgery—Optional cones or mMLC[3]
Treatment couch—Exact ETR, Exact (optional)[3]
iCBCT—No[3]
ART (adaptive radiotherapy)—No[3]
VMAT—Only with OBI[3]
Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]oncologysystems.comoncologysystems.com