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0010-22161 High EFF RF MatchversusSEZ RST 201

Applied Materials 0010-22161 High EFF RF Match, Lam Research SEZ RST 201, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
SEZ RST 201Lam Research
OEMApplied MaterialsLam Research
Category——
Wafer size——
Process node——
Introduced——
Production run—1997–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchLam Research SEZ
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]RST 201[3]
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Configuration—Single Cleaning[3]
Manufacturer—Lam / SEZ[3]
Wafer Sizes—8 inch[3]
Tool type—single cleaning tool[3]
Process type—single-wafer wet chemical processor[4]
Process chamber count—single process chamber[4]
Load ports—two open-cassette load ports[4]
Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com