Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, KLA 6220, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | 6220KLA |
|---|---|---|
| OEM | Applied Materials | KLA |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | KLA 6220 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | 6220[3] |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Inspection type | — | Particle inspection system[4] |
| Wafer sizes | — | 2", 3", 4", 6", and 8" wafers capable[4] |
| Illumination source | — | 30 mW argon-ion laser, 488 nm wavelength[4] |
| Throughput | — | 100 wph (200 mm) at 0.12 mm[4] |
| Sensitivity | — | 90 nm sensitivity, >80% capture rate[5] |