Comparison ledger
Applied Materials 0010-18024 Pyrometer Assembly, Hitachi NB 5000 Dual Beam FIB-SEM, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-18024 Pyrometer AssemblyApplied Materials | NB 5000 Dual Beam FIB-SEMHitachi |
|---|---|---|
| OEM | Applied Materials | Hitachi |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-18024 Pyrometer Assembly | Hitachi NB 5000 Dual Beam FIB-SEM |
| Specifications | ||
| Configuration | Capable of working on Applied Materials Radiance[1] | Premium System[2] |
| Power | — | 8kVA[3] |
| Frequency | — | 50/60 Hz[3] |
| Input voltage | — | 200 / 208 / 230 Vac[3] |
| SEM resolution | — | 1.0nm @ 15Kv[2] |
| FIB resolution | — | 5nm @ 40Kv[2] |
| FIB column beam range | — | 1Kv - 40Kv[2] |
| FIB column beam current | — | >50nA max beam current (operable)[2] |
| SEM column beam range | — | 0.5Kv - 30Kv[2] |
| SEM electron gun | — | ZrO/W Schottky emission electron gun[2] |
| SEM column beam current | — | >30nA max beam current[2] |
| Pattern generator | — | 4K X 4K Pattern Generator System[2] |
| Image memory | — | 2560 X 1920[2] |
| Display | — | Dual Monitor Simultaneous Display[2] |
| Vacuum system | — | Turbo Molecular Pump; Dry Pump (250 I/s @60hz); Ion source chamber Ion pump (20 I/s); Getter Pump (100 l/s); Electron gun chamber Ion pump (30 l/s); Intermediate chamber Ion pump (30 l/s)[2] |
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