Comparison ledger
Applied Materials 0010-14300 Magnet Assy, Axcelis Purion H 200 High Current, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-14300 Magnet AssyApplied Materials | Purion H 200 High CurrentAxcelis |
|---|---|---|
| OEM | Applied Materials | Axcelis |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-14300 Magnet Assy | Axcelis Purion H 200 High Current |
| Specifications | ||
| Configuration | P4 Magnet Assy, IMP[1] | — |
| Gearbox P/N | 0010-27417[1] | — |
| Part Number | 0010-14300[1] | — |
| Description | P4 Magnet Assy, IMP[1] | — |
| Manufacturer | — | Axcelis[2] |
| Model | — | Purion H 200[2] |
| Tool type | — | High Current Implanter[2] |
| Wafer size | — | 12 inch[2] |
| Tool description | — | single wafer high current implanter[3] |
| Maximum single charge energy range | — | up to 230 keV[3] |
| Maximum accel voltage | — | 170 kV[3] |
| High-current beamline capability | — | greater than 20 mA of beam currents[3] |
| Wafer sizes | — | 12 inch; 6 inch; 200 mm; 150 mm; 300 mm[3] |
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