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Comparison ledger

0010-14300 Magnet AssyversusNV 8200

Applied Materials 0010-14300 Magnet Assy, Axcelis NV 8200, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-14300 Magnet AssyApplied Materials
NV 8200Axcelis
OEMApplied MaterialsAxcelis
CategoryIon ImplantationIon Implantation
Wafer size—200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-14300 Magnet AssyAxcelis NV 8200
Specifications
ConfigurationP4 Magnet Assy, IMP[1]Gas lines:[2]
Gearbox P/N0010-27417[1]—
Part Number0010-14300[1]—
DescriptionP4 Magnet Assy, IMP[1]—
Energy config.—from 3 to 250keV (single); up to 750 keV (triple)[2]
Wafer size—Wafer size 200mm with holders for different wafers sizes[2]
Dose—> 1E11at/cm²[2]
Beam current—I < 1mA[2]
Ion sources—3 ion sources with dual vaporizer on each source[2]
Magnet—Dipole magnet 90° - Buckley Systems – de 0 a 75 AMU in full charge[2]
Cryo compressor—CTI Cryogenics 9600[2]
Make—Axcelis[3]
Model—NV 8200[3]
Wafer Sizes—8 inch[4]
Process gas lines—4 process gas lines (BF2/PH3/AsH3/Hydrogen)[2]
Gas line—1 gas line (Argon)[2]
Mass range—0 to 75 AMU in full charge[2]
Target positioning / scanning system—Parallel beam; electrostatic angle correction programmable; tilt 0°-60°[2]
End station—Flat/notch alignment with buffet cassette (3 cassette positions); 3 axis robotic; Pick & Place system[2]
Turbo pumps—Edwards STP 1003C for Source; Pfeiffer HiPace 300 + Pfeiffer TPH 1201 P for Beam Line[2]
Rough pumps—Adixen A 103 P for Source; Adixen A 103 P for Beam Line; Alcatel/Adixen ADS 602 P for End Station[2]
Clamp type—Electrostatic clamp[2]
Software—SPARC V[2]
Soft—SPARC V[2]
Non-functional modules—PC remote[2]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing