Comparison ledger
Applied Materials 0010-13622 RF Match for, Veeco K 465 GaN MOCVD, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | K 465 GaN MOCVDVeeco |
|---|---|---|
| OEM | Applied Materials | Veeco |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Veeco K 465 GaN MOCVD |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | K465 GaN Turbo disk[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Phase | — | 3 Phase, 5 Wire[2] |
| Voltage | — | 380 Vac, 280 A, 50/60 Hz[2] |
| Process | — | GaN MOCVD[2] |
| Power | — | 3 Phase, 5 Wire, 380 Vac, 280 A, 50/60 Hz[2] |
| Vintage | — | 2010 (asset 151584), 2010 (asset 151583), 2010 (asset 151582), 2009 (asset 151581), 2009 (asset 151580)[2] |
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