Comparison ledger
Applied Materials 0010-13622 RF Match for, Varian M 2 i, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | M 2 iVarian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Varian M 2 i |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | With:[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Equipment type | — | Sputtering system[2] |
| Wafer size | — | 6 inch[2] |
| Included components | — | Alpha computer; load lock; turbo pump; Edwards dry pump; turbo controller; VME computer; orienter; hand off station; cryo pump; load arm; DCM servo controller; transfer servo controller; power supply; gas controller; ion gauge controller; compressor; chiller[2] |
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