Comparison ledger
Applied Materials 0010-13622 RF Match for, Tokyo Electron Indy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | IndyTokyo Electron |
|---|---|---|
| OEM | Applied Materials | Tokyo Electron |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Tokyo Electron Indy |
| Cited variants | — |
|
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[2] | — |
| Model | 0010-13622[2] | Indy[3] |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[2] | — |
| Feature | High Efficiency HE RF Match-Bias[2] | — |
| Manufacturer | — | Tokyo Electron[3] |
| Category | — | Deposition[3] |
| Model variant | — | Indy-B-L[1] |
| Process | — | HiK Dielectric Process[1] |
| Wafer size | — | 300mm[1] |
| Main power | — | 480VAC, 3 phase[1] |
| Load stations | — | Two load stations[1] |
Plan your fab
Building a Deposition process? Get a complete equipment list.
Open the fab equipment planner →