Comparison ledger
Applied Materials 0010-13622 RF Match for, Applied Materials Centura 5200 HTF EPI, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Centura 5200 HTF EPIApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Applied Materials Centura 5200 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[2] | RP[1] |
| Model | 0010-13622[2] | Centura 5200 HTF[1] |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[2] | — |
| Feature | High Efficiency HE RF Match-Bias[2] | — |
| Process | — | Epitaxial Silicon Deposition[1] |
| Wafer Size | — | 8 inch (200 mm)[4] |
| Vintage | — | 2004-01-06[4] |
| OEM | — | Applied Materials[1] |
| Wafer size | — | 8 inch[1] |
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