Waferpedia

Comparison ledger

0010-03485 Magnet Assyversus4002

Applied Materials 0010-03485 Magnet Assy, Tektronix 4002, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
4002Tektronix
OEMApplied MaterialsTektronix
Category——
Wafer size——
Process node——
Introduced—1969
Production run—1969–
Lifecycle——
Lifecycle milestones—1972 Replaced by Tektronix 4010
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyTektronix 4002
Cited variants—
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Display technology—Storage tube[1]
Display feature—Partial storage tube with refresh section[1]
Introduced—1969[1]
Host interface—Requires host adaptor[1]
Graphics input capability—Supported via 4901/4903 Interactive Graphic Unit[1]
Sources (5)Every fact above is drawn from these public sources
  1. [1]en.wikipedia.orgen.wikipedia.org
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com