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Comparison ledger

0010-03485 Magnet AssyversusMCS 8 Spin

Applied Materials 0010-03485 Magnet Assy, SUSS MicroTec MCS 8 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
MCS 8 SpinSUSS MicroTec
OEMApplied MaterialsSUSS MicroTec
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssySUSS MicroTec MCS 8 Spin
Specifications
ConfigurationWP AL 300mm PVD[1]Spin coating, developing, baking, and cleaning[6]
OEMApplied Materials[1]—
Model0010-03485[1]MCS 8[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Make—SUSS[5]
Product name—SUSS MCS 8 Spin Coater[5]
Platform name—MCS8[6]
System type—Manual Coating & Developing System[6]
Settings—Over 500 settings[6]
Modules—Up to six frames with two modules each; up to twelve modules in a single LabCluster[6]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]Equipment inventory listing
  6. [6]suss.comsuss.com