Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusE-PL10

Applied Materials 0010-03485 Magnet Assy, Olympus E-PL10, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
E-PL10Olympus
OEMApplied MaterialsOlympus
Category——
Wafer size——
Process node—Micro Four Thirds mirrorless camera
Introduced——
Production run—2019–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyOlympus E-PL10
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Sensor resolution—20 megapixels[5]
Sensor type—Micro Four Thirds[5]
Mount—Micro Four Thirds[5]
Release year—2019[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]grokipedia.comgrokipedia.com