Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Lam Research SEZ 201, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | SEZ 201Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Lam Research SEZ 201 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | 3 2 SM[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | SEZ 201[7] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | Wafer Backside etcher with 2 x SMIF[7] |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | 8 inch[5] |
| Version | Spares[4] | 200mm[7] |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | Lam Research[5] |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Equipment type | — | Wafer backside etcher[5] |
| Manufacturer designation | — | Lam / SEZ[6] |
| Category | — | Etch[5] |
| Configuration & options | — | 2 SM[5] |
| Tool type | — | Backside etcher[5] |
| SMIF | — | 2 x SMIF[7] |