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Comparison ledger

0010-03485 Magnet AssyversusIGX 1000 N

Applied Materials 0010-03485 Magnet Assy, Edwards IGX 1000 N, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
IGX 1000 NEdwards
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyEdwards IGX 1000 N
Cited variants—
  • iGX1000N 200-230V 50/60 Hz[1]
  • iGX1000N 380-460V 50/60 Hz[1]
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Pumping speed—800 m³/h (471 CFM)[1]
Ultimate pressure—1.00×10⁻⁴ mbar (7.5×10⁻⁴ Torr)[1]
Inlet connection—ISO100[6]
Exhaust connection—NW25 (KF25)[1]
Weight—230 kg (507 lbs)[1]
Motor power—2.1 hp[1]
Power at ultimate (700 Torr exhaust)—1.6 kW[1]
AUC (Active Utility Controller) power—1.05 kW[1]
Cooling water flow—2 slm[1]
Nitrogen purge flow—4 or 14 slm[1]
Footprint (excluding exhaust)—0.20 m²[1]
Noise at ultimate—< 55 dB(A)[1]
Sources (6)Every fact above is drawn from these public sources
  1. [1]ptbsales.comptbsales.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]provac.comprovac.com