Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusA 412 Dual Reactor

Applied Materials 0010-03485 Magnet Assy, ASM A 412 Dual Reactor, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsASM
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyASM A 412 Dual Reactor
Cited variants—
  • A 412 Dual Reactor - Doped Poly[1]
  • A 412 Dual Reactor - Nitride[2]
  • ASM A 412 Dual Reactor - Doped Poly[1]
  • ASM A 412 Dual Reactor - Nitride[2]
Specifications
ConfigurationWP AL 300mm PVD[3]Doped Poly[1]
OEMApplied Materials[3]—
Model0010-03485[3]A 412[1]
DescriptionMAGNET ASSY, WP AL 300MM PVD[4]—
ProcessPVD[5]Nitride[7]
Wafer size300mm[6]—
VersionSpares[6]—
Part Number0010-03485[3]—
ManufacturerApplied Materials[3]—
Process TypePVD (Physical Vapor Deposition)[3]—
Application (Material)Aluminum (AL)[3]—
Wafer Diameter (associated)300 mm[3]—
Make—ASM[1]
Sources (8)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]inventory listing
  4. [4]semistarcorp.comsemistarcorp.com
  5. [5]layla-ec.comlayla-ec.com
  6. [6]fabsurplus.comfabsurplus.com
  7. [7]Equipment inventory listing
  8. [8]Equipment inventory listing