Waferpedia

Comparison ledger

0010-03254 E Chuckversus23EX

Applied Materials 0010-03254 E Chuck, Varian 23EX, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
23EXVarian
OEMApplied MaterialsVarian
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Varian 23EX
Specifications
Power Source—Klystron[1]
Photon Energy Configuration—6 & 10/15/18/25 MV[1]
Max Dose Rate Photons—600 MU/min[1]
Electron Energies—Yes[1]
Max Dose Rate Electrons—1000 MU/min[1]
Multi-Leaf Collimator (MLC)—80-leaf (field size 40x40 cm); optional 120-leaf (central 20 cm: 5 mm leaf width, outer 20 cm: 10 mm leaf width)[1]
Portal Imager (EPID)—LC250, aS500, aS1000 (optional)[1]
KV Imaging for IGRT—OBI (optional)[1]
Cone-Beam CT—Only with OBI[1]
VMAT—Only with OBI[1]
Treatment Couch—Exact ETR, Exact (optional)[1]
Sources (1)Every fact above is drawn from these public sources
  1. [1]oncologysystems.comoncologysystems.com