Comparison ledger
Applied Materials 0010-03254 E Chuck, Tokyo Electron Act 8 Coater Developer Track, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | Act 8 Coater Developer TrackTokyo Electron |
|---|---|---|
| OEM | Applied Materials | Tokyo Electron |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1997– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Tokyo Electron Act |
| Specifications | ||
| Loading | — | Cassette to Cassette[1] |
| Manufacturer | — | Tokyo Electron[1] |
| Model | — | Act 8[1] |
| Equipment type | — | Coater / Developer Track[1] |
| Wafer size | — | 6 inch[1] |
| Purpose | — | Photoresist spin-coater and developer[2] |
| Configuration | — | Coater and developer track in-line with the ASML PAS5500/350C stepper[3] |
| Configured wafer size | — | 100 mm (4")[3] |
| Optional wafer size conversion | — | 150 mm (6")[3] |
| Process type | — | DUV lithography using KrF photoresist and ancillary anti-reflective coatings[3] |
| Production debut year | — | 1997[4] |
| Original wafer size | — | 200mm wafers[4] |