Comparison ledger
Aixtron 2800 G 4 HT MOCVD Reactor, Applied Materials 0010-13622 RF Match for, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 2800 G 4 HT MOCVD ReactorAixtron | 0010-13622 RF Match forApplied Materials |
|---|---|---|
| OEM | Aixtron | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Aixtron 2800 G 4 HT MOCVD Reactor | Applied Materials 0010-13622 RF Match for |
| Specifications | ||
| Software Version | AIXACT 7.4.1.99[1] | — |
| PLC | 3.12.1 or 3.13.3 (depending on reactor)[1] | — |
| Configuration | SLC[1] | High Efficiency HE RF Match-Bias[3] |
| Process | InGaN MOCVD Epitaxy[1] | — |
| Wafer | 6 x 6"[1] | — |
| Metal Organic Source | TMIn x 3, TMGa x 2, TEGa x 2, TMAl x 1, Cp2Mg x 1, Future x 3[1] | — |
| Hydride Source | NH3 x 3, 100 ppm SiH4 in Ar x 2, Future x 2[1] | — |
| Concentration Monitors | Epison4 x 3 for TMIn, Epison4 x 1 for TMAl[1] | — |
| Purifiers | Entegris Getters for NH3, H2 & N2[1] | — |
| Heating System | RF Coil with Trumpf Hunttinger RF Generator TruHeat 7120[1] | — |
| Glove Box | MBraun Nitrogen Glovebox with Controller[1] | — |
| Process Pump | Ebara ESA 70 W or ESA 80 W[1] | — |
| DOR & Glove Box Pumps | Adixen ACP - 15 x 2[1] | — |
| Abatement | Unisem UN 2000 A-WHG (shared across 2 reactors)[1] | — |
| Reactor Chillers | Tek-Temp Recirculating Closed Loop Chiller[1] | — |
| In-Situ Pyrometry | Laytec Pyro 400 with EpiNET 2.2 for Feedback Temperature Control[1] | — |
| SLC | SLC[1] | — |
| Exhaust System | Custom Built Exhaust System[1] | — |
| Metal Organic Sources | TMIn x 3, TMGa x 2, TEGa x 2, TMAl x 1, Cp2Mg x 1, Future x 3[1] | — |
| Hydride Sources | NH3 x 3, 100 ppm SiH4 in Ar x 2, Future x 2[1] | — |
| Chiller Baths | 6 available for MO Sources[1] | — |
| Filters | Filters[1] | — |
| Reactor Chiller | Tek-Temp Recirculating Closed Loop Chiller[1] | — |
| Ceiling Temperature Control | Ceiling Temperature Control, Custom Built Automatic Ceiling Loader[1] | — |
| Gas Foil Rotation (GFR) | Individual GFR Control for Each Puck[1] | — |
| Spare Channels | 23 Spare MFC Channels & 10 Spare Valve Output Channels[1] | — |
| Vintage | 2008 to 2012 Vintage[1] | — |
| Model | — | 0010-13622[3] |
| Product Type | — | RF Match for PVD (Physical Vapor Deposition)[3] |
| Feature | — | High Efficiency HE RF Match-Bias[3] |
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